产品展示

联系方式

成都芯光光电科技有限公司
地址:中国四川省成都市天府新区华阳街道东华巷46号
电话:028-85134602
邮箱:sales@sinopto.cn
网址:www.sinopto.cn

当前位置: 网站首页 > 产品展示 > 光学元件 > 光栅
光栅

全息光栅

全息光栅
  • 型号TTL
  • 品牌

详细描述

AMO offers flexible exposure and development services for gratings in a cleanroom environment on two dedicated actively stabilized interferometres. Pattern transfer and further processing can be carried out according to customer requirements. AMO provides highly spacial coherent gratings from 180 nm up to 2500 nm on several substrate up to 6" all with tailored pitch, etch depth and size.
Applications for holographic Gratings
  • Diffraction gratings
  • Encoder gratings
  • Imprint templates
  • Polarizers
  • Spectroscopy
  • Beam splitting
  • Beam scanning
  • Laser scanners
  • Photonic crystals
  • Metrology
  • Telecommunication gratings
  • Drug discovery
Specification
Interference lithography (IL) is an optical holographic lithography technology where an interference pattern of two ultra violet light beams is recorded in a high resolution photo sensitive material. The periodic patterns are stitch free and spatially coherent over many square centimetres with features smaller than 100 nm. The grating pitch remains constant over the entire area with a deviation of less 0.5 nm. The IL process at AMO is designed for high contrast gratings recorded in standard DUV photo resist suitable for anisotropic pattern transfer. IL is the most suitable lithography for precision gratings.
Substrate Material Silicon or fused silica  
Substrate thickness Typical 500 µm to 650 µm  
Substrate size Up to 6 inch and any rectangular within. (Sometimes 8" possible)  
Grating pitch 180 nm to 2500 nm Gratings in stock
Etch depth 90 nm to 2500 nm  
Line width 40 nm to 1500 nm  
Active grating area Up to 140 mm in diameter  
Samples of 2x2 cm are available starting from 500 €
 
 
Interference Lithography Gratings Examples
Linear gratings
Image
Substrate
Size
Period
Uniformity
Etching Depth
ILL500-1  silicon 6" 500 ± 5% on demand
ILL180-6 silicon 6" 180 ± 5% 130
ILL513-2 silicon 6" 513 ± 5% 150
ILL180-4 silicon 6" 180 ± 5% 130
 
 
 
         
Hole Pattern
Image
Substrate
Size
Period
Uniformity
Etching Depth
ILH513-6 silicon 6" 513 ± 5% 200
ILH500-4 silicon 6" 500 ± 5% on demand
 
 
 
         
Post Pattern
Image
Substrate
Size
Period
Uniformity
Etching Depth
ILP500-4 silicon 4" 500 ± 5% on demand
ILP500-6 silicon 6" 500 ± 5% on demand
 
Further holographic gratings with similar specifications are available and could be deep etched on request.
 
点击次数:  更新时间:2018-03-14 11:11:26  【打印此页】  【关闭
上一条:标准反射光栅  下一条:没有了